2D Carbide MXene under postetch low-temperature annealing for high-performance supercapacitor electrode
ELECTROCHIMICA ACTA
Authors: Zhang, Zhirong; Yao, Zhongping; Zhang, Xiao; Jiang, Zhaohua
Abstract
MXene, as an emerging class of conductive two-dimensional materials, have extraordinary applications in the field of electrochemical energy storage. However, the intrisic capacity of MXene still need to be improved due to the large gap to their theoretical capacity. Here, we provide a facile and new strategy to enhance their electrochemical performance-postetch low-temperature annealing (below 400 degrees C) under Ar atmosphere. Due to the formation of more C-Ti-O active sites and larger interlayer voids, the Ti3C2Tx freestanding film annealed under 200 degrees C exhibits a high capacitance of 429 F/g and energy density of 29.2 Wh/Kg in 1 M H2SO4 electrolyte, it could withstand 5000 cycles with 89% of the capacitance retention. By comparison, the Ti3C2Tx annealed at higher temperature (400 degrees C), presented a high resistance and poor electrochemical property because of partial oxidation and breaking of Ti-C bond on the surface of MXene nanosheets, despite the larger interlayer voids and low -F contents, . This work is not only probing the importance to maintain the original structure of MXene but also proposing a new strategy to realizing a high capacitance of pure MXene electrode. (C) 2020 Elsevier Ltd. All rights reserved.
Impact of UV-induced ozone and low-energy Ar+-ion cleaning on the chemical structure of Cu(In,Ga)(S,Se)(2) absorber surfaces
JOURNAL OF APPLIED PHYSICS
Authors: van Maris, Victor R.; Hauschild, Dirk; Niesen, Thomas P.; Eraerds, Patrick; Dalibor, Thomas; Palm, Joerg; Blum, Monika; Yang, Wanli; Heske, Clemens; Weinhardt, Lothar
Abstract
Dry buffer layer deposition techniques for chalcopyrite (CIGSSe)-based thin-film solar cells lack the surface-cleaning characteristics of the commonly used CdS or Zn(O,S) wet-chemical bath deposition. A UV-induced ozone and/or a low-energy Ar+-ion treatment could provide dry CIGSSe surface cleaning steps. To study the impact of these treatments, the chemical surface structure of a CIGSSe absorber is investigated. For this purpose, a set of surface-sensitive spectroscopic methods, i.e., laboratory-based x-ray photoelectron spectroscopy and x-ray-excited Auger electron spectroscopy, is combined with synchrotron-based soft x-ray emission spectroscopy. After treatment times as short as 15s, the UV-induced ozone treatment decreases the amount of carbon adsorbates at the CIGSSe surface significantly, while the oxygen content increases. This is accompanied by the oxidation of all absorber surface elements, i.e., indium, selenium, sulfur, and copper. Short (60s) low-energy Ar+-ion treatments, in contrast, primarily remove oxygen from the surface. Longer treatment times also lead to a removal of carbon, while extremely long treatment times can also lead to additional (likely metallic) Cu phases at the absorber surface as well.