Mouse Anti-Human Rheumatoid Factor monoclonal antibody, clone SG3-28-210.3

The complex dielectric functions of unhydrogenated amorphous silicon (a-Si) thin films, grown by the radio-frequency magnetron-sputtering (RFMS) technique, at room temperature, upon glass substrates, have been accurately determined by using ex-situ variable-angle spectroscopic ellipsometry, in the photon energy range from 0.73 to 4.96 eV (i.e. 1700 to 250 nm). Mass density of sputter-deposited amorphous silicon films was changed by a simple argon-working-gas pressure control: higher Ar gas pressure results in reduced film mass density, or increased porosity. The optical response of the hydrogen-less amorphous silicon films under study can be successfully parameterized employing a single, Kramers-Kronig (K-K)-consistent Cody-Lorentz (CL) oscillator dispersion model; the Urbach absorption tail included in the CL model, is certainly needed in the present case of hydrogen-free sputtered a-Si films. It has been unambiguously demonstrated that the obtained values of CL-model parameters are reasonably correlated with the particular argon-gas sputtering pressure utilized for each deposition. The behavior of these best-fit CL-model parameters with varying argon pressure from 0.13Pa up to 4.4Pa, can be clearly understood in terms of the effect of the existing micro-voids, within the as-deposited a-Si film material.

The a-C:H:TiOx coating deposited by radio-frequency plasma-enhanced chemical vapor deposition (RF PECVD) method, using methane and titanium (IV) isopropoxide mixture atmosphere, was post-deposition annealed at 400 degrees C in the atmosphere of air. Phase composition and coating structure were studied in detail by Raman spectroscopy, X-ray diffraction and transmission electron microscopy. Depending on the duration of the annealing process, two stages of transformation were identified. In the first stage, during the first 30 min of annealing, processes related to the degradation of a carbon matrix occurred. Characteristic bands attributed to carbon coatings disappeared in Raman spectra and hardness decreased from 10 GPa measured for the as-deposited coating to 2.7 GPa. In the second stage, after additional 10 min of annealing, the coating transformed into a crystalline TiO2 in which two polymorphs (anatase and srilankite) coexisted.