Medicaid expansion, health insurance coverage, and cost barriers to care among low-income adults with asthma: the Adult Asthma Call-Back Survey
JOURNAL OF ASTHMA
Authors: Hsu, Joy; Qin, Xiaoting; Mirabelli, Maria C.; Flanders, W. Dana
Abstract
Objective To examine Medicaid expansion (ME) effects on health insurance coverage (HIC) and cost barriers to medical care among people with asthma. Method We analyzed 2012-2013 and 2015-2016 data from low-income adults with current asthma aged 18-64 years in the Behavioral Risk Factor Surveillance System Asthma Call-Back Survey (state-level telephone survey). We calculated weighted percentages and 95% confidence intervals from ME and non-ME jurisdictions (according to 2014 ME status). Outcomes were HIC and cost barriers to buying asthma medication (MED), seeing a health care provider for asthma (HCP), or any asthma care (AAC). Using SUDAAN, we performed survey-weighted difference-in-differences analyses, adjusting for demographics. Subgroup analyses were stratified by demographics. Results Our study population included 6445 participants from 25 states plus Puerto Rico. In 2015-2016 compared to 2012-2013, HIC was more common in ME jurisdictions (P < 0.001) but unchanged in non-ME jurisdictions. Adjusted difference-in-differences analyses showed ME was associated with a statistically significant 13.36 percentage-point increase in HIC (standard error = 0.053). Cost barriers to MED, HCP, and AAC did not change significantly for either group in descriptive and difference-in-differences analyses. In subgroup analyses, we noted variation in outcomes by demographics and 2014 ME status. Conclusions We found ME significantly affected HIC among low-income adults with asthma, but not cost barriers to asthma-related health care. Strategies to reduce cost barriers to asthma care could further improve health care access among low-income adults with asthma in ME jurisdictions.
Silicon damage control through the use of aromatic hydrocarbon ion implantation
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
Authors: Lee, KyungWon; Ameen, Michael Saied; Harris, Mark Alan; Roh, Dwight Dongwan; Reece, Ronald Norman; Yoon, DaeHo
Abstract
The continuous shrinking of transistor devices calls for precise doping profile control. Generally, monomer carbon (C+) is implanted at doses too low to adequately form an amorphous layer in silicon. Previous experiments used a molecular carbon species combined with dedicated vaporizer-based hardware, but this experiment was carried out using a commercial implanter and source with a liquid precursor material. The use of higher mass molecular carbon ions, such as C7H7+, impart significantly more damage to the silicon than the monomer, and can easily result in a well-defined amorphous layer. There are many species of molecular carbon that can be implanted, but in order to utilize a hot cathode plasma (HCP) ion source some additional criteria must be met. The source feed material should fragment with high-yield of molecular carbon (C-x(+) = 2-8) ions, which could then be extracted at beam currents sufficient to meet production needs using standard ion implant techniques. In this work, we surveyed several candidates for forming the molecular carbon species that could meet the requirements outlined above, reported the performance in plasma formation, and investigated materials properties of the Si after implantation.